Quantitative determination of dielectric thin-film properties on product wafers using infrared reflection-absorption spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 6, 1998, Pages 3490-3494

  Niemczyk, Thomas M ^a   Zhang, Lizhong ^a   Haaland, David M ^b   Radigan, Kenneth J ^c,d  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c NATIONAL SEMICONDUCTOR CORPORATION   (United States)

^d APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032328531     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581508     Document Type: Article

References (12)

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