High resolution electron microscopy observation of different Al-oxide layers in magnetic tunnel junctions

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 8, 2001, Pages 5058-5064

  Yu, Andrew Chak Chung ^a,b   Doole, Ron ^b   Petford Long, Amanda ^b   Miyazaki, Terunobu ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

Al oxide; Alumina; High resolution electron microscopy; Magnetic tunnel junction; Natural oxidation; Plasma oxidation; Sputtering; Thermal oxidation

Indexed keywords

ELECTRODES; HIGH RESOLUTION ELECTRON MICROSCOPY; MAGNETORESISTANCE; MAGNETRON SPUTTERING; MICROSTRUCTURE; SURFACE ROUGHNESS; THERMOOXIDATION; TUNNEL JUNCTIONS;

MAGNETIC TUNNEL JUNCTIONS (MTJ);

ALUMINA;

EID: 0035414510     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.5058     Document Type: Article

References (13)