High-magnetoresistance tunnel junctions using Co75Fe25 ferromagnetic electrodes

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 5 B, 2000, Pages

  Han, Xiu Feng ^a   Daibou, Tadaomi ^a   Kamijo, Makoto ^a   Yaoita, Kazuya ^a   Kubota, Hitoshi ^a   Ando, Yasuo ^a   Miyazaki, Terunobu ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; COBALT ALLOYS; ELECTRIC FIELD EFFECTS; ELECTRODES; FERROMAGNETIC MATERIALS; MAGNETIC SEMICONDUCTORS; MAGNETORESISTANCE; SEMICONDUCTOR JUNCTIONS;

COBALT IRON ALLOYS; FERROMAGNETIC ELECTRODES; TUNNELING MAGNETORESISTANCE;

TUNNEL JUNCTIONS;

EID: 0033723033     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l439     Document Type: Article

References (16)