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Volumn 48, Issue 7, 2001, Pages 1394-1399
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Three-dimensional CMOS SOI integrated circuit using high-temperature metal-induced lateral crystallization
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Author keywords
3 D integrated circuits; Metal induced lateral crystallization; SOI; Thin film transistors
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Indexed keywords
METAL-INDUCED LATERAL CRYSTALLIZATION (MILC);
AMORPHOUS SILICON;
CAPACITANCE;
EPITAXIAL GROWTH;
FABRICATION;
GRAIN SIZE AND SHAPE;
OSCILLATORS (ELECTRONIC);
SILICON ON INSULATOR TECHNOLOGY;
THIN FILM TRANSISTORS;
CMOS INTEGRATED CIRCUITS;
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EID: 0035395689
PISSN: 00189383
EISSN: None
Source Type: Journal
DOI: 10.1109/16.930657 Document Type: Article |
Times cited : (33)
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References (9)
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