Multiple layers of silicon-on-insulator (MLSOI) islands fabrication process and fully-depleted SOI pMOSFETs

IEEE International SOI Conference

Volumn , Issue , 1998, Pages 15-16

  Pae, Sangwoo ^a   Su, Taichi ^a   Denton, John P ^a   Neudeck, Gerold W ^a   Stout, James C ^a   Janes, David B ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; MOSFET DEVICES; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTIVE ION ETCHING; SEMICONDUCTING FILMS; SEMICONDUCTOR GROWTH;

EPITAXIAL LATERAL OVERGROWTH (ELO); MULTIPLE LAYERS OF SILICON-ON-INSULATOR (MLSOI) TECHNOLOGY; SELECTIVE EPITAXIAL GROWTH (SEG);

SILICON ON INSULATOR TECHNOLOGY;

EID: 0032311572     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)