Local current fluctuations before and after breakdown of thin SiO2 films observed with conductive atomic force microscope

Microelectronics Reliability

Volumn 41, Issue 7, 2001, Pages 1041-1044

  Porti, M ^a   Blasco, X ^a   Nafria M ^a   Aymerich, X ^a   Olbrich, A ^b   Ebersberger, B ^b  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEGRADATION; ELECTRIC BREAKDOWN; SILICA; THIN FILMS;

CONDUCTIVE ATOMIC FORCE MICROSCOPY (C-AFM);

SEMICONDUCTING FILMS;

EID: 0035394276     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(01)00066-X     Document Type: Article

References (13)