Conducting atomic force microscopy for nanoscale electrical characterization of thin SiO2

Applied Physics Letters

Volumn 73, Issue 21, 1998, Pages 3114-3116

  Olbrich, Alexander ^a   Ebersberger, Bernd ^a   Boit, Christian ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; MOS CAPACITORS; NANOSTRUCTURED MATERIALS; SILICA;

FOWLER-NORDHEIM TUNNELING CURRENT; OXIDE THINNING;

THIN FILMS;

EID: 0032561607     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122690     Document Type: Article

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