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Volumn 45, Issue 7, 2001, Pages 1127-1135

Electrical characterization of ultrathin oxides of silicon grown by wet oxidation at 800°C

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC BREAKDOWN; ELECTRIC CHARGE; MOS DEVICES; POSITIVE IONS; SEMICONDUCTOR GROWTH; THERMAL EFFECTS; THERMOOXIDATION; TUNNEL DIODES; ULTRATHIN FILMS; VAPOR PRESSURE;

EID: 0035390617     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(01)00136-8     Document Type: Article
Times cited : (7)

References (24)
  • 12
    • 0032624222 scopus 로고    scopus 로고
    • Effects of oxidation ambient and low temperature post oxidation anneal on the silicon/oxide interface structure and the electrical properties of the thin gate oxide
    • (1999) Japan J Appl Phys , vol.38 , pp. 12-16
    • Cho, W.1    Kim, Y.2    Kim, E.3    Kim, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.