Growth of ultrathin oxides of silicon by low temperature wet oxidation technique

Materials Research Bulletin

Volumn 34, Issue 10-11, 1999, Pages 1797-1803

  Bhat, Vishwanath Krishna ^a   Pattabiraman, M ^a   Bhat, K N ^a   Subrahmanyam, A ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY MADRAS   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CRYSTAL ORIENTATION; MATHEMATICAL MODELS; OXIDATION; OXIDES; THERMAL EFFECTS; VAPOR PRESSURE;

ULTRATHIN OXIDE; WET OXIDATION;

SEMICONDUCTING SILICON;

EID: 0343627101     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0025-5408(99)00158-0     Document Type: Article

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