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Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 724-732

The effects of substrate rotation on thermal plasma chemical vapor deposition of diamond

(4) Asmann, M a Borges, C F M b Heberlein, J a Pfender, E a

a UNIVERSITY OF MINNESOTA (United States)

b VEECO INSTRUMENTS INC (United States)

Author keywords

DC arcjet; Diamond CVD; Substrate rotation

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DC MOTORS; FLUID DYNAMICS; PLASMAS; SUBSTRATES; SURFACE ROUGHNESS;

PLASMA GAS MIXTURES;

DIAMOND FILMS;

VAPOR DEPOSITION;

EID: 0035387387 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(01)01176-8 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.