Diamond synthesis on a substrate rotated at high speed

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

Volumn 62, Issue 5, 1996, Pages 671-675

  Hirata, Atsushi ^a   Yokotsuka, Tomohito ^a   Ohtsuki, Yutaka ^a   Yoshikawa, Masanori ^a  

^a NONE

Author keywords

Arc discharge; Chemical vapor deposition; Diamond; Growth rate; Morphology; Numerical simulation; Plasma flow; Plasma jet; Rotating substrate; Thickness and quality variations

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ELECTRIC DISCHARGES; FILM GROWTH; GRAIN GROWTH; GRAIN SIZE AND SHAPE; MORPHOLOGY; PLASMA FLOW; PLASMA JETS; SUBSTRATES; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL);

DIAMOND SYNTHESIS; GROWTH RATE;

DIAMOND FILMS;

EID: 0030147832     PISSN: 09120289     EISSN: None     Source Type: Journal    
DOI: 10.2493/jjspe.62.671     Document Type: Article

References (11)

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