Plasma chemical vapour deposition of aluminium oxide on hardmetals

International Journal of Refractory Metals and Hard Materials

Volumn 14, Issue 1-3 SPEC. ISS., 1996, Pages 79-84

  Tabersky, R ^a   Van Den Berg, H ^a   Konig U ^a  

^a Krupp Widia GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030535949     PISSN: 02634368     EISSN: None     Source Type: Journal    
DOI: 10.1016/0263-4368(96)83420-2     Document Type: Article

References (21)

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13. Yoon, J. S., Potwin, G. F., Doerr, H. A., Deshpanday, C. V. & Bunshan, R. F., Fabrication of aluminium oxide films with high deposition rates using the activated reactive evaporation technique. Surface and Coatings Technology, 43/44 (1990) 213-22.
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