Properties of TiN-TiC multilayer coatings using plasma-assisted chemical vapor deposition

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 906-910

  Kim, Duk Jae ^a   Cho, Young Rae ^a   Lee, Myoung Jae ^a   Hong, Jung Mi ^a   Kim, Yoon Kee ^a   Lee, Keun Ho ^a  

^a Institute for Advanced Engineering (IAE)   (South Korea)

Author keywords

PACVD; Plasma parameter; Titanium carbide

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; DIES; METHANE; MULTILAYERS; OXIDES; PLASMA APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STOICHIOMETRY; TITANIUM CARBIDE; TITANIUM NITRIDE; TOOL STEEL;

PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION (PACVD);

CERAMIC COATINGS;

CERAMIC COATING; MICROSTRUCTURE; PLASMA TREATMENT; STEEL; VAPOR DEPOSITION;

EID: 0033370812     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00149-8     Document Type: Conference Paper

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