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Volumn 42, Issue 3, 1999, Pages 37-47

Advanced wet and dry cleaning coming together for next generation

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0002568059     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article
Times cited : (34)

References (31)
  • 1
    • 0344666922 scopus 로고    scopus 로고
    • Cleaning Technology in Semiconductor Device Manufacturing V
    • J. Ruzyllo, R. Novak, Eds.
    • T. Hattori, in Cleaning Technology in Semiconductor Device Manufacturing V, J. Ruzyllo, R. Novak, Eds., The Electrochem. Soc. Proc., Vol. 97-35, p. 1, 1998.
    • (1998) The Electrochem. Soc. Proc. , vol.97 , Issue.35 , pp. 1
    • Hattori, T.1
  • 6
    • 0345838449 scopus 로고    scopus 로고
    • Information on recent related SST articles can be obtained from our sebsite
    • Information on recent related SST articles can be obtained from our sebsite: http://www.solid-state.com/sst/99issue/.
  • 7
    • 0346469338 scopus 로고    scopus 로고
    • Leuven, Belgium, November
    • IMEC Newsletter, Leuven, Belgium, No. 23, November 1998.
    • (1998) IMEC Newsletter , vol.23
  • 12
    • 0343952903 scopus 로고    scopus 로고
    • H.R. Huff, H. Tsuya, U. Gösele, Eds, The Electrochem Soc Pro Series; PV98-1
    • P.W. Mertens, et al., Silicon Materials Science and Technology, H.R. Huff, H. Tsuya, U. Gösele, Eds, The Electrochem Soc Pro Series; PV98-1, p. 592, 1998.
    • (1998) Silicon Materials Science and Technology , pp. 592
    • Mertens, P.W.1
  • 16
    • 0345838454 scopus 로고    scopus 로고
    • Oostende, Belgium
    • H. Kanetaka, et al., Proc. UCPSS '98, Oostende, Belgium. p. 46, 1998.
    • (1998) Proc. UCPSS '98 , pp. 46
    • Kanetaka, H.1
  • 20
    • 0346469345 scopus 로고    scopus 로고
    • Oostende, Belgium, Sept, 21-23
    • J. Ruzyllo, et al., Proc. UCPSS'98, Oostende, Belgium, Sept, 21-23, 1998.
    • (1998) Proc. UCPSS'98
    • Ruzyllo, J.1
  • 22
    • 0347730223 scopus 로고    scopus 로고
    • Semicon. Dev. Manufacturing V., J. Ruzyllo and R. Novak, Eds., The Electrochemical Society Proceedings
    • H. K. Yuh, J. W. Park, K. H. Hwang, E. Yoon, and K. W. Whang, in Cleaning Technol. in Semicon. Dev. Manufacturing V., J. Ruzyllo and R. Novak, Eds., The Electrochemical Society Proceedings, Vol. 97-35, p. 307, 1998.
    • (1998) Cleaning Technol. , vol.97 , Issue.35 , pp. 307
    • Yuh, H.K.1    Park, J.W.2    Hwang, K.H.3    Yoon, E.4    Whang, K.W.5
  • 23
    • 0346469345 scopus 로고    scopus 로고
    • Oostende, Belgium, Sept, 21-23
    • J. Ruzyllo et al., Proc. UCPSS'98, Oostende, Belgium, Sept, 21-23, 1998.
    • (1998) Proc. UCPSS'98
    • Ruzyllo, J.1
  • 24
    • 0345838455 scopus 로고    scopus 로고
    • Oostende, Belgium, Sept, 21-23
    • M. Caymax, et al., Proc. UCPSS'98, Oostende, Belgium, Sept, 21-23, 1998.
    • (1998) Proc. UCPSS'98
    • Caymax, M.1
  • 27
    • 0347730229 scopus 로고
    • Ph.D. Thesis, Penn State University
    • K. Torek, Ph.D. Thesis, Penn State University, 1995.
    • (1995)
    • Torek, K.1
  • 31
    • 0347730221 scopus 로고
    • Semicon. Dev. Manufacturing, J. Ruzyllo and R. Novak, Eds., The Electrochem. Soc. Proc.
    • S. E. Beck, et al., in Cleaning Technol. in Semicon. Dev. Manufacturing, J. Ruzyllo and R. Novak, Eds., The Electrochem. Soc. Proc. Vol. 94-7, p. 253, 1994.
    • (1994) Cleaning Technol. , vol.94 , Issue.7 , pp. 253
    • Beck, S.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.