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Volumn 19, Issue 3, 2001, Pages 893-898

Low energy O2+ and N2+ beam-induced profile broadening effects in Si

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD EFFECTS; ION BOMBARDMENT; ION IMPLANTATION; PROFILOMETRY; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS;

EID: 0035334445     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1354602     Document Type: Article
Times cited : (3)

References (27)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.