Dependence of the properties of (SrxTi1-x)O3 thin films deposited by plasma-enhanced metal-organic chemical vapor deposition on electron cyclotron resonance plasma

Thin Solid Films

Volumn 301, Issue 1-2, 1997, Pages 154-161

  Lee, Joon Sung ^a   Song, Han Wook ^a   Jun, Byung Hyuk ^a   Kwack, Dong Hwa ^a   Yu, Byoung Gon ^b   Jiang, Zhong Tao ^a   No, Kwangsoo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Chemical vapour deposition (CVD); Dielectric properties; Oxides; Plasma processing and deposition

Indexed keywords

CERAMIC COATINGS; ELECTRON CYCLOTRON RESONANCE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDES; PLASMA APPLICATIONS; STRONTIUM; TITANIUM;

FILM QUALITY; FILM THICKNESS; TITANATE FILMS;

THIN FILMS;

EID: 0031152660     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00002-3     Document Type: Article

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