SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 4 B, 2001, Pages 2712-2716

Formation of high-temperature stable Co-silicide from Co0.92Ta0.08/Si systems

(9) Lee, Deok Hyung a Ko, Dae Hong a Ku, Ja Hum b Choi, Siyoung b Fujihara, Kazuyuki b Kang, Ho Kyu b Oh, Sang Ho c Park, Chan Gyung c Lee, Hoo Jeung d

a Yonsei University (South Korea)

b SAMSUNG Electronics (South Korea)

c Pohang University of Science and Technology (POSTECH) (South Korea)

d STANFORD UNIVERSITY (United States)

Author keywords

Agglomeration; Co silicide; Co Ta alloy; Co0.92Ta0.08 Si; CoSi2; Thermal stability

Indexed keywords

AGGLOMERATION; ARGON; AUGER ELECTRON SPECTROSCOPY; BINARY ALLOYS; GRAIN BOUNDARIES; MAGNETRON SPUTTERING; RAPID THERMAL ANNEALING; SILICON; SUBSTRATES; THERMAL EFFECTS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

INTERFACIAL ENERGY; MORPHOLOGICAL TRANSFORMATIONS;

SEMICONDUCTING FILMS;

EID: 0035300660 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.2712 Document Type: Article

Times cited : (1)

References (19)

1
- 0003926828
- Academic Press, New York
- (1983) Silicides for VLSI Applications
- Murarka, S.P.¹

2
- 0032226795
- IEEE
- (1998) Proc. 5th Int. Conf. Solid-State and Integrated Circuit Technology , pp. 271
- Mo, H.-X.¹ Qu, X.-P.² Liu, J.-H.³ Ru, G.-P.⁴ Li, B.-Z.⁵

3
- 0026851251
- (1992) Jpn. J. Appl. Phys. , vol.31 , pp. 1004
- Yang, F.-M.¹ Chen, M.-C.²

4
- 0027703140
- (1993) Mater. Sci. Eng. Rep. , vol.R11 , pp. 53
- Maex, K.¹

5
- 0032048902
- (1998) J. Electrochem. Soc. , vol.145 , pp. 1384
- Gambino, J.P.¹ Colgan, E.G.² Domenicucci, A.G.³ Cunningham, B.⁴

6
- 0030086048
- (1996) Mater. Sci. Eng. Rep. , vol.R16 , pp. 43
- Colgan, E.G.¹ Gambino, J.P.² Hong, Q.Z.³

7
- 0000367043
- (1991) Appl. Phys. Lett. , vol.58 , pp. 1308
- Lawrence, M.¹ Dass, A.² Fraser, D.B.³ Wei, C.-S.⁴

8
- 0000945394
- (1997) J. Appl. Phys. , vol.82 , pp. 2323
- Kim, G.B.¹ Kwak, J.S.² Baik, H.K.³

9
- 0001556983
- (1999) Appl. Phys. Lett. , vol.74 , pp. 2930
- Detavernier, C.¹ Van Meirhaeghe, R.L.² Cardon, F.³

10
- 0029360033
- (1995) J. Electrochem. Soc. , vol.142 , pp. 2805
- Byun, J.S.¹ Kim, J.J.² Kim, W.S.³

11
- 0001602280
- (1996) Appl. Phys. Lett. , vol.68 , pp. 3461
- Tung, R.T.¹

12
- 0000795526
- (1999) J. Appl. Phys. , vol.85 , pp. 1503
- Kim, G.B.¹ Kwak, J.S.² Baik, H.K.³

13
- 0033149245
- (1999) Thin Solid Films , vol.346 , pp. 244
- Kim, D.¹ Jeon, H.²

14
- 36449000477
- (1991) J. Appl. Phys. , vol.70 , pp. 7579
- Hsia, S.L.¹ Tan, T.Y.²

15
- 0024054980
- (1988) Thin Solid Films , vol.162 , pp. 199
- Wang, S.Q.¹ Hung, L.S.² Mayer, J.W.³

16
- 0031619282
- (1998) Sypm. Very Large Scale Integration Tech. , pp. 188
- Iinuma, T.¹ Akutsu, H.² Ohuchi, K.³ Miyashita, K.⁴ Toyoshima, Y.⁵ Suguro, K.⁶

17
- 0000191487
- (American Society for Metals, OH) 2nd ed.
- (1986) Binary Alloy Phase Diagrams , vol.2 , pp. 1245
- Massalski, T.B.¹

18
- 0030212480
- (1996) J. Mater. Sci. Mater. Electron. , vol.7 , pp. 271
- Jang, S.-Y.¹ Lee, S.-M.² Baik, H.-K.³

19
- 0000864669
- (1998) Appl. Phys. Lett. , vol.73 , pp. 2302
- Sohn, D.-K.¹ Park, J.-S.² Lee, B.H.³ Bae, J.-U.⁴ Byun, J.S.⁵ Kim, J.J.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.