Thickness-dependent thermal reliability of low-dielectric constant polycrystalline PTFE submicron dielectric thin films

Microelectronics Journal

Volumn 32, Issue 3, 2001, Pages 215-219

  Kim, H K ^a   Shi, F G ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; POLYTETRAFLUOROETHYLENES; THERMAL EFFECTS; THIN FILMS;

INTERLEVEL DIELECTRICS (ILD);

DIELECTRIC FILMS;

EID: 0035280543     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(00)00125-7     Document Type: Article

References (17)

1. Peters L. Semicond. Int. 23:(6):2000;108-124.
2. Miller R.D. Science. 286:(5439):1999;421-423.
3. Peters L. Semicond. Int. 22:(13):1999;56-64.
4. Peters L. Semicond. Int. 21:(10):1998;64-74.
5. H.K. Kim, F.G. Shi, B. Zhao, M. Brongo, Conference Record of the 2000 IEEE International Symposium on Electrical Insulation, 2000, pp. 62-65.
6. Wang J., Kim H.K., Shi F.G., Zhao B., Nieh T.G. Thin Solid Films. 2000;. (in press).
7. Wang J., Shi F.G., Nieh T.G., Zhao B., Brongo M.R., Qu S., Rosenmayer T. Scripta Mater. 42:(7):2000;687-694.
8. Hsu D.T., Kim H.K., Shi F.G., Zhao B., Brongo M. Mater. Sci., Process. Reliabil. Issues. 99-7:2000;62-68. (Proceedings of the Fourth International Symposium of Low and High Dielectric Constant Materials).
9. Hsu D.T., Kim H.K., Shi F.G., Zhao B., Brongo M., Schilling P., Wang S.-Q. SPIE Proc. 3883:1999;60-67. (Conference on Multilevel Interconnect Technology III).
10. Hsu D.T., Shi F.G., Zhao B., Brongo M. Mater. Sci., Process. Reliabil. Issues. 99-7:2000;53-61. (Proceedings of the Fourth International Symposium of Low and High Dielectric Constant Materials).
11. Shi F.G. J. Mater. Res. 9:(5):1994;1307-1313.
12. Jiang Q., Tong H.Y., Hsu D.T., Okuyama K., Shi F.G. Thin Solid Films. 312:(1/2):1998;357-361.
13. C.T. Rosenmayer, J.W. Bartz, J. Hammes, Symposium on Low-Dielectric Constant Materials III, 1997, pp. 231-236.
14. Ueno Y., Fujii T., Kannari F. Appl. Phys. Lett. 65:(11):1994;1370-1372.
15. Li S.T., Arenholz E., Heitz J., Bauerle D. Appl. Surf. Sci. 125:(1):1998;17-22.
16. Jiang W.B., Norton M.G., Tsung L., Dickinson J.T. J. Mater. Res. 10:(4):1995;1038-1043.
17. Usui H., Koshikawa H., Tanaka K. J. Vac. Sci. Technol., A. 13:(5):1995;2318-2324.