Planarization processes and applications II. B2O3/P2O5 doped GeO2-SiO2 glasses

Journal of the Electrochemical Society

Volumn 146, Issue 10, 1999, Pages 3872-3885

  Simpson, Darreil L ^a,b   Croswell, Robert T ^a   Reisman, Arnold ^a   Temple, Dorota ^a   Kenneth Williams, C ^a  

^a North Carolina State University   (United States)

^b MCNC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DIELECTRIC FILMS; ENERGY DISPERSIVE SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GERMANIUM COMPOUNDS; SEMICONDUCTING GLASS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SILICA; SYNTHESIS (CHEMICAL);

GERMANOSILICATE GLASSES;

SEMICONDUCTING FILMS;

EID: 0033343705     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392566     Document Type: Article

References (10)

1. D.L. Simpson, R. T. Croswell, A. Reisman, D. Temple, and C. K. Williams, J. Electrochem. Soc., 146,3860 (1999).
2. S.M. Fisher, H. Chino, K. Maeda, and Y. Nishimoto, Solid State Technol., 36, 55 (1993).
3. The National Technology Roadmapfor Semiconductors, p. 98, SIA (1994).
4. K. Nassau and D. L. Chadwick, 7. Am. Ceram. Soc.. 66, 332 (1983).
5. D.L. Simpson, R. T. Croswell, A. Reisman, C. K. Williams, and D. Temple, J. Eleclrochem. Soc., Submitted.
6. CRC Handbook of Chemistry and Physics, 76th ed., D. R. Lide, Editor, CRC Press, Inc., Boca Raton, FL (1995).
7. R.M. Levin and A. C. Adams, J. Electrochem. Soc., 129, 1588 (1982).
8. W. Kern and R. K. Smeltzer, Solid State Technol., 28,171 (1985).
9. T. Inoue, Jpn. J. Appl. Phys., 16, 851 (1977).
10. R.T. Croswell, Ph.D. Thesis, North Carolina State University, Raleigh, NC (1998).