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Volumn 19, Issue 2, 2001, Pages 573-578

Fabrication of gated cathode structures using an in situ grown vertically aligned carbon nanofiber as a field emission element

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; CATHODES; ELECTRON BEAM LITHOGRAPHY; ELECTRON EMISSION; ELECTROSTATICS; GROWTH (MATERIALS); METALLIZING; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTIVE ION ETCHING; THERMAL EFFECTS;

EID: 0035271392     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1358855     Document Type: Article
Times cited : (51)

References (16)
  • 1
    • 0032776996 scopus 로고    scopus 로고
    • For a comprehensive review of this technology refer to D. Temple, Mater. Sci. Eng., R. 24, 185 (1999).
    • (1999) Mater. Sci. Eng., R. , vol.24 , pp. 185
    • Temple, D.1
  • 14
    • 0022024901 scopus 로고
    • The ammonia - vapor-based image reversal process causes base-catalyzed decarboxylation of the indene carboxylic acid in the irradiated areas of the pattern, making these areas insoluble in developer. The subsequent UV flood exposure converts previously unexposed areas to indene carboxylic acid, which are soluble in developer. For more information on this process refer to H. Moritz, IEEE Trans. Electron Devices ED-32, 672 (1985).
    • (1985) IEEE Trans. Electron Devices , vol.ED-32 , pp. 672
    • Moritz, H.1
  • 15
    • 0342381558 scopus 로고    scopus 로고
    • note
    • Alignment was measured by first identifying the perimeter of the gate aperture in an SEM (LEO, 982), finding the center of that circle, and then measuring the offset between that point and the center of the Ni catalyst site on the substrate surface.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.