Organic functional group introduced to Si(1 1 1) via silicon-carbon bond: A liquid-phase approach

Applied Surface Science

Volumn 171, Issue 3-4, 2001, Pages 252-256

  Okubo, Tatsuya ^a   Tsuchiya, Hiroshi ^a   Sadakata, Masayoshi ^a   Yasuda, Tetsuji ^b   Tanaka, Kazunobu ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYLATION; CARBON; CHEMICAL BONDS; CHLORINATION; CONTAMINATION; LIQUID METALS; OXYGEN; PHASE TRANSITIONS; SUBSTRATES; SURFACE TREATMENT;

ORGANIC FUNCTIONAL GROUP;

SILICON;

EID: 0035252528     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00759-5     Document Type: Article

References (16)

1. Ulman A. Chem. Rev. 96:1996;1533.
2. Buriak J.M. Adv. Mater. 11:1999;265.
3. Stewart M.P., Buriak J.M. Angew. Chem. Int. Ed. 37:1998;3257.
4. Kim N.Y., Laibinis P.E. J. Am. Chem. Soc. 119:1997;2297.
5. Linford M.R., Chidsey C.E.D. J. Am. Chem. Soc. 115:1993;12631.
6. Linford M.R., Fenter P., Eisenberger P.M., Chidsey C.E.D. J. Am. Chem. Soc. 117:1995;3145.
7. Terry J., Linford M.R., Wigren C., Cao R.Y., Pianetta P., Chidsey C.E.D. Appl. Phys. Lett. 71:1997;1056.
8. Terry J., Linford M.R., Wigren C., Cao R.Y., Pianetta P., Chidsey C.E.D. J. Appl. Phys. 85:1999;213.
9. Teplyakov A.V., Kong M.J., Bent S.F. J. Am. Chem. Soc. 119:1997;11100.
10. Hovis J.S., Lee S., Liu H., Hamers R.J. J. Vac. Sci. Technol. B. 15:1997;1153.
11. Hovis J.S., Hamers R.J. J. Phys. Chem. B. 101:1997;9581.
12. Sieval A.B., Demirel A.L., Nissink J.W.M., Linford M.R., van der Mass J.H., de Jeu W.H., Zuilhof H., Scdholter E.J.R. Langmuir. 14:1998;1759.
13. Banser A., Li X.L., Lauermann I., Lewis N.S., Yi S.I., Weinberg W.H. J. Am. Chem. Soc. 118:1996;7225.
14. Higashi G.S., Chabal Y.J., Trucks G.W., Raghavachari K. Appl. Phys. Lett. 56:1990;656.
15. Higashi G.S., Becker R.S., Chabal Y.J., Becker A.J. Appl. Phys. Lett. 58:1991;1656.
16. Yarmoff J.A., Shuh D.K., Durbin T.D., Lo C.W., Smith D.A.L., Mcfeely F.R., Himpsel F.J. J. Vac. Sci. Technol. A. 10:1992;2303.