Variable-energy positron lifetime study of silicon-oxide films plasma deposited from hexamethyldisiloxane and oxygen mixtures

Journal of Applied Polymer Science

Volumn 79, Issue 6, 2001, Pages 974-980

  Wang, C L ^a,d   Kobayashi, Y ^a,b   Togashi, H ^a   Hirata, K ^a,b   Suzuki, R ^b   Ohdaira, T ^b   Mikado, T ^b   Hishita, S ^c  

^a NATL INST OF MAT AND CHEM RES   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^d WASHINGTON STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; ORGANIC COMPOUNDS; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; POSITRON ANNIHILATION SPECTROSCOPY; PRESSURE EFFECTS; SILICA; STRUCTURE (COMPOSITION); X RAY PHOTOELECTRON SPECTROSCOPY;

HEXAMETHYLDISILOXANE; ORTHO POSITRONIUM LIFETIME; PLASMA POLYMERIZED FILM; SILICON OXIDE FILMS; VARIABLE ENERGY POSITRON ANNIHILATION LIFETIME SPECTROSCOPY;

PLASTIC FILMS;

EID: 0035252004     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/1097-4628(20010207)79:6<974::AID-APP30>3.0.CO;2-D     Document Type: Article

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