Effect of the Pb/Ti Source Ratio on the Crystallization of PbTiO3 Thin Films Grown by Metalorganic Chemical Vapor Deposition at Low Temperature of 400°C

Journal of the American Ceramic Society

Volumn 84, Issue 1, 2001, Pages 207-213

  Wang, Chae Hyun ^a   Choi, Doo Jin ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPOSITION EFFECTS; CRYSTALLIZATION; FILM GROWTH; LEAD COMPOUNDS; LOW TEMPERATURE EFFECTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICA; THIN FILMS; TITANIUM;

INTERMEDIATE RATIO; LEAD TITANATE; TITANIUM ISOPROPOXIDE;

CERAMIC MATERIALS;

EID: 0035241566     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2001.tb00632.x     Document Type: Article

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