Microstructural defects of device quality hot-wire CVD poly-silicon films

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 573-578

  Rath, J K ^a   Fdtichelaar, ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; CRYSTAL MICROSTRUCTURE; CURRENT DENSITY; HYDROGEN; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON;

HYDROGEN DILUTION; INTERCONNECTED VOIDS; POLYSILICON FILMS;

THIN FILMS;

EID: 0033297393     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-573     Document Type: Article

References (5)

1. J.Meier, P.Torres, R.Platz, S.Dubail, U.Kroll, J.A.Anna Selvan, N.Pellaton Vaucher, Ch. Hof, D.Fischer, H.Keppner, A.Shah, K.-D.Ufert, P.Giannaoules, J.Koeler, in "Amorphous Silicon Technology-1996", Edited by M.Hack, E.A.Schiff, S.Wagner, R.Schropp and A.Matsuda, Mat. Res. Soc. Symp. Proc., 420,3 (1996).
2. J.K.Rath, H. Meiling, R.E.I.Schropp, Jpn. J. Appl. Phys., 36,5436 (1997).
3. J.K.Rath, F.D.Tichelaar, H.Meiling, R.E.I.Schropp, in "Amorphous and Microcrystalline Silicon Technology-1998", Edited by R.Schropp, H.Branz, S.Wagner, M.Hack and I.Shimizu, Mat. Res. Soc. Symp. Proc., 507,879 (1998).
4. R.E.I.Schropp, K.F.Feenstra, E.C.Molenbroek, H.Meiling, J.K.Rath, Phil. Mag. B., 76, 309 (1997).
5. J.R.Patel, Semiconductor Silicon 1981 (Elêctrochem. Soc. Pennington, 1981) p189.