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Volumn 32, Issue 1, 2001, Pages 53-60

Stochastic simulation of electromigration failure of flip chip solder bumps

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTROMIGRATION; FAILURE ANALYSIS; RANDOM PROCESSES; SOLDERING; TIN ALLOYS;

EID: 0035192617     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(00)00100-2     Document Type: Article
Times cited : (11)

References (11)
  • 2
    • 0032668835 scopus 로고    scopus 로고
    • Electromigration in integrated circuit conductors
    • Lloyd J.R. Electromigration in integrated circuit conductors. J. Phys. D: Appl. Phys. 99:1999;R109-R118.
    • (1999) J. Phys. D: Appl. Phys. , vol.99 , pp. 109-R118
    • Lloyd, J.R.1
  • 4
    • 0032614180 scopus 로고    scopus 로고
    • Microstructure-electromigration correlation in a thin stripe of eutectic SnPb solder stressed between Cu electrodes
    • Liu C.Y., Chen C., Liao C.N., Tu K.N. Microstructure-electromigration correlation in a thin stripe of eutectic SnPb solder stressed between Cu electrodes. Appl. Phys. Lett. 75:1999;58-60.
    • (1999) Appl. Phys. Lett. , vol.75 , pp. 58-60
    • Liu, C.Y.1    Chen, C.2    Liao, C.N.3    Tu, K.N.4
  • 6
    • 0000755918 scopus 로고    scopus 로고
    • Scaling and universality in electrical failure of thin films
    • Pennetta C., Reggiani L., et al. Scaling and universality in electrical failure of thin films. Phys. Rev. Lett. 84:2000;5006-5009.
    • (2000) Phys. Rev. Lett. , vol.84 , pp. 5006-5009
    • Pennetta, C.1    Reggiani, L.2
  • 7
    • 0033143204 scopus 로고    scopus 로고
    • A stochastic approach to failure analysis in electromigration phenomena
    • Pennetta C., Reggiani L., et al. A stochastic approach to failure analysis in electromigration phenomena. Microelectron. Reliab. 39:1999;857-862.
    • (1999) Microelectron. Reliab. , vol.39 , pp. 857-862
    • Pennetta, C.1    Reggiani, L.2
  • 10
    • 0347611299 scopus 로고    scopus 로고
    • Interface diffusion in eutectic Pb-Sn solder
    • Gupta D., Vieregge K., Gust W. Interface diffusion in eutectic Pb-Sn solder. Acta Mater. 47:1999;5-12.
    • (1999) Acta Mater. , vol.47 , pp. 5-12
    • Gupta, D.1    Vieregge, K.2    Gust, W.3
  • 11
    • 0033221986 scopus 로고    scopus 로고
    • Long term noise measurements and median time to failure test for the characterization of electromigration in metal lines
    • Ciofi C., Dattilo V., Neri B., Foley S., Mathewson A. Long term noise measurements and median time to failure test for the characterization of electromigration in metal lines. Microelectron. Reliab. 39:1999;1691-1696.
    • (1999) Microelectron. Reliab. , vol.39 , pp. 1691-1696
    • Ciofi, C.1    Dattilo, V.2    Neri, B.3    Foley, S.4    Mathewson, A.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.