Stochastic approach to failure analysis in electromigration phenomena

Microelectronics Reliability

Volumn 39, Issue 6-7, 1999, Pages 857-862

  Pennetta, C ^a   Reggiani, L ^a   Trefan Gy ^a   Fantini, F ^b   De Munari, I ^c   Scorzoni, A ^d  

^a UNIVERSITY OF SALENTO   (Italy)

^b UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^c UNIVERSITY OF PARMA   (Italy)

^d Dipto Ingegneria Elettron dell' I   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CIRCUIT THEORY; DEFECTS; ELECTRIC CONDUCTORS; ELECTRIC RESISTANCE; FAILURE ANALYSIS; RANDOM PROCESSES; RELIABILITY; SUBSTRATES;

RANDOM RESISTOR NETWORK; THIN FILM CONDUCTORS;

ELECTROMIGRATION;

EID: 0033143204     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(99)00113-4     Document Type: Article

References (8)

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8. B. K. Jones and Y. Z. Xu, Rev. Sci. Instrum. 66, 4676, 1995. 35, 13, 1995.