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Volumn 647, Issue , 2001, Pages
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Optimization of the ion-cut process in Si and SiC
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL BONDS;
HETEROJUNCTIONS;
ION IMPLANTATION;
OPTIMIZATION;
SILICON CARBIDE;
SILICON ON INSULATOR TECHNOLOGY;
TEMPERATURE;
EXFOLIATION;
HYDROPHILIC WAFER BONDING;
ION CUT PROCESS;
TEMPERATURE IRRADIATION;
SEMICONDUCTING SILICON;
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EID: 0035187519
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (4)
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References (14)
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