Simulation of EUVL mask defect printability

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue 1, 2001, Pages 703-709

  Ryoo, Manhyoung ^a   Ito, Masa ^a   Lee, Byoung Taek ^a   Ogawa, Taro ^a   Okazaki, Shinj ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEFECTS; INTEGRATED CIRCUIT MANUFACTURE; LIGHT ABSORPTION; LIGHT REFLECTION; MASKS; MULTILAYERS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; MASK DEFECT; PRINTABILITY;

PHOTOLITHOGRAPHY;

EID: 0035180146     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.438371     Document Type: Article

References (6)

1. Simulation of multilayer defects in extreme ultraviolet masks