메뉴 건너뛰기




Volumn , Issue , 2001, Pages 368-375

Mass production of quartz high-speed chemical etching applied to AT-cut wafers

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; CRYSTAL GROWTH; CRYSTALS; ETCHING; LAPPING; WASHING; WSI CIRCUITS;

EID: 0035161342     PISSN: 01616404     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (52)
  • 30
    • 0027663836 scopus 로고
    • A review of the chemical reaction mechanism and kinetics of hydrofluorite acid etching of silicon dioxide for surface micromachining applications
    • (1993) Thin Solid Films , vol.232 , pp. 1-12
    • Monk, D.J.1    Soane, D.S.2
  • 37


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.