Electrical behavior of the fundamental high frequency (150 MHz) quartz crystal unit in the plasmatic environment

Proceedings of the Annual IEEE International Frequency Control Symposium

Volumn , Issue , 1997, Pages 758-764

  Tanaka, M ^a   Ugajin, T ^a   Araki, N ^a   Oomura, Y ^a  

^a MEIDENSHA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; ETCHING; GOLD; METALLIC FILMS; PHOTOLITHOGRAPHY; PLASMA APPLICATIONS;

PLASMA TREATMENT;

CRYSTAL RESONATORS;

EID: 0031378883     PISSN: 01616404     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)