Ion beam induced reaction of carbon films on Si(1 0 0)

Applied Surface Science

Volumn 169-170, Issue , 2001, Pages 296-299

  Hishita, Shunichi ^a   Aizawa, Takashi ^a   Suehara, Shigeru ^a   Haneda, Hajime ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; EPITAXIAL GROWTH; FILM GROWTH; ION BOMBARDMENT; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING SILICON; SILICON CARBIDE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

TURBOSTRATIC GRAPHITE;

SURFACE STRUCTURE;

EID: 0035128341     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00677-2     Document Type: Article

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