Fabrication of microsieves with sub-micron pore size by laser interference lithography

Journal of Micromechanics and Microengineering

Volumn 11, Issue 1, 2001, Pages 33-37

  Kuiper, Stein ^a   Van Wolferen, Henk ^a   Van Rijn, Cees ^a   Nijdam, Wietze ^a   Krijnen, Gijs ^a   Elwenspoek, Miko ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FABRICATION; MICROFILTRATION; MICROSTRUCTURE; PHOTORESISTORS; PORE SIZE; REACTIVE ION ETCHING; SIEVES;

LASER INTERFERENCE LITHOGRAPHY; MICROSIEVES; RESIST LAYERS;

LITHOGRAPHY;

EID: 0035124643     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/11/1/306     Document Type: Article

References (12)

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