Growth and characterization of rapid thermal chlorinated oxides grown using in situ generated HCI

Journal of the Electrochemical Society

Volumn 148, Issue 1, 2001, Pages

  Sharangpani, Rahul ^a   Tay, Sing Pin ^a  

^a STEAG RTF Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHLORINATION; GASES; HYDROCHLORIC ACID; INTERFACES (MATERIALS); SECONDARY ION MASS SPECTROMETRY; SILICON WAFERS;

RAPID THERMAL PROCESSING (RTP);

OXIDES;

EID: 0035119608     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1344553     Document Type: Article

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