Rapid thermal processes for future nanometer MOS devices

Materials Research Society Symposium - Proceedings

Volumn 525, Issue , 1998, Pages 171-180

  Hauser, John R ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; MOS DEVICES; NANOSTRUCTURED MATERIALS; SEMICONDUCTOR DEVICE STRUCTURES;

RAPID THERMAL PROCESSING; SOURCE/DRAIN CONTACTING STRUCTURES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031637798     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-525-171     Document Type: Conference Paper

References (12)