Influence of HCl on rapid thermal oxides

Materials Research Society Symposium - Proceedings

Volumn 429, Issue , 1996, Pages 219-224

  Hames, G A ^a   Beck, S E ^a   Gilicinski, A G ^a   Henson, W K ^a   Wortman, J J ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAPACITORS; CHLORINE; MOSFET DEVICES; OXIDATION; OXIDES; SECONDARY ION MASS SPECTROMETRY; SURFACES;

HYDROGEN CHLORIDE; MOS CAPACITORS; RAPID THERMAL OXIDES;

HYDROGEN INORGANIC COMPOUNDS;

EID: 0030413374     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-429-219     Document Type: Conference Paper

References (9)