Chlorine precursors for gate oxidation processes

Materials Research Society Symposium - Proceedings

Volumn 447, Issue , 1997, Pages 115-125

  Mc geary, M J ^a   Mertens, P W ^a   Vermeire, B ^a   Heyns, M ^a   Sprey, H ^a   Lubbers, A ^a   Schaekers, M ^a  

^a Olin Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC CHEMISTRY; CHLORINE COMPOUNDS; COMBUSTION; DECONTAMINATION; ELECTRIC PROPERTIES; INDUSTRIAL HYGIENE; METALS; OXIDATION; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES; VAPORIZATION;

CHLORINE PRECURSORS; GATE OXIDATION PROCESSES; OXALYL CHLORIDE; TRICHLOROETHANE;

CHLORINE;

EID: 0030692173     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (26)