Effect of the hydrogen on the intrinsic stress in hydrogenated amorphous carbon films deposited from an electron cyclotron resonance plasma

Applied Physics Letters

Volumn 73, Issue 22, 1998, Pages 3226-3228

  Racine, B ^a   Benlahsen, M ^a   Zellama, K ^a   Goudeau, P ^b   Zarrabian, M ^c   Turban, G ^c  

^a Universite de Picardie Jules Verne   (France)

^b UMR 6630 CNRS   (France)

^c INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001404468     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122726     Document Type: Article

References (15)

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