Lens aberration measurement technique using attenuated phase-shifting mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Imai, Akira ^a   Hayano, Katsuya ^a   Fukuda, Hiroshi ^a   Asai, Naoko ^a   Hasegawa, Norio ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; LIGHT MEASUREMENT; MEASUREMENT ERRORS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

ATTENUATED PHASE SHIFTING MASKS (APSM); LIGHT INTENSITY; PATTERN DELINEATION CHARACTERISTICS;

OPTICAL INSTRUMENT LENSES;

EID: 0033713106     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)