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Physica B: Condensed Matter

Volumn 302-303, Issue , 2001, Pages 193-196

Shallow thermal donors in silicon doped with isotopic oxygen

(3) Yang, Deren a Klevermann, M b Murin, L I c

a ZHEJIANG UNIVERSITY (China)

b LUND UNIVERSITY (Sweden)

c INSTITUTE OF SOLID STATE AND SEMICONDUCTOR PHYSICS (Belarus)

Author keywords

Nitrogen; Oxygen; Shallow thermal donor; Silicon

Indexed keywords

ANNEALING; CRYSTAL GROWTH FROM MELT; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITROGEN; OXYGEN; SEMICONDUCTOR DOPING; SEMICONDUCTOR GROWTH;

SHALLOW THERMAL DONORS (STD);

SEMICONDUCTING SILICON;

EID: 0034977014 PISSN: 09214526 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-4526(01)00427-6 Document Type: Conference Paper

Times cited : (11)

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