α-C:H films for photonic structures fabrication

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4318, Issue , 2001, Pages 295-300

  Kopustinskas, Vitoldas ^a   Grigaliunas, Viktoras ^a   Jucius, Dalius ^a   Meskinis, Sarunas ^a   Margelevicius, Mindaugas ^b   Tomasiunas, Rolandas ^c  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

^b KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

^c VILNIUS UNIVERSITY   (Lithuania)

Author keywords

Direct ion beam deposition; Hydrogenated amorphous carbon films; Photonic band gap microstructures; Reactive ion etching

Indexed keywords

ENERGY GAP; MICROSTRUCTURE; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; SUBSTRATES;

PHOTONIC BANDGAP (PBG) MICROSTRUCTURES;

AMORPHOUS FILMS;

EID: 0034946205     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.417614     Document Type: Article

References (20)

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