Fabrication of InP submicron pillars for two-dimensional photonic crystals by reactive ion etching

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 7172-7176

  Hatate, Hitoshi ^a   Hashimoto, Masayuki ^a   Shirakawa, Hirofumi ^a   Fujiwara, Yasufumi ^a   Takeda, Yoshikazu ^a   Nakano, Hirohiko ^b   Tatsuta, Toshiaki ^b   Tsuji, Osamu ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b 33 Tanakamiya cho Takeda F   (Japan)

Author keywords

Electron cyclotron resonance; Fourier transformed infrared reflection absorption spectrometry; Inductively coupled plasma; InP; Photonic crystal; Reactive ion etching; Submicron pillar

Indexed keywords

EID: 0000601536     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.7172     Document Type: Article

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