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Volumn 51, Issue 3, 1998, Pages 445-451

Amorphous carbon film deposition using a DC-biased screen-grid in an electron cyclotron resonance plasma

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0004575107     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00192-4     Document Type: Article
Times cited : (2)

References (29)
  • 15
    • 0037585567 scopus 로고
    • Trans Tech Publications, Switzerland
    • Aisenberg, S. and Kimock, F. M., Materials Science Forum, 52-53, Trans Tech Publications, Switzerland, 1989, pp. 1-40.
    • (1989) Materials Science Forum , vol.52-53 , pp. 1-40
    • Aisenberg, S.1    Kimock, F.M.2
  • 18
    • 0000251494 scopus 로고
    • Trans Tech Publications, Switzerland
    • Yoshikawa, M., Materials Science Forum, 52-53, Trans Tech Publications, Switzerland, 1989, p. 365.
    • (1989) Materials Science Forum , vol.52-53 , pp. 365
    • Yoshikawa, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.