Three-dimensional band mapping by angle-dependent very-low-energy electron diffraction and photoemission: Methodology and application to Cu

Physical Review B - Condensed Matter and Materials Physics

Volumn 63, Issue 20, 2001, Pages

  Strocov, V N ^a,g   Claessen, R ^a   Nicolay, G ^b   Hufner S ^b   Kimura, A ^c   Harasawa, A ^c   Shin, S ^c   Kakizaki, A ^d   Starnberg, H I ^e   Nilsson, P O ^e   Blaha, P ^f  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b SAARLAND UNIVERSITY   (Germany)

^c UNIVERSITY OF TOKYO   (Japan)

^d INSTITUTE OF MATERIALS STRUCTURE SCIENCE   (Japan)

^e CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^f VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^g Institute of High Performance Calculating and Data Bases   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER;

ARTICLE; CRYSTALLIZATION; ELECTRON DIFFRACTION; ENERGY; GEOMETRY; MATHEMATICAL ANALYSIS; METHODOLOGY; SOLID STATE; THREE DIMENSIONAL IMAGING;

EID: 0034884399     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.63.205108     Document Type: Article

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