Absolute band mapping by combined angle-dependent very-low-energy electron diffraction and photoemission: Application to Cu

Physical Review Letters

Volumn 81, Issue 22, 1998, Pages 4943-4946

  Strocov, V N ^a,b,f   Claessen, R ^a   Nicolay, G ^a   Hufner S ^a   Kimura, A ^c   Harasawa, A ^c   Shin, S ^c   Kakizaki, A ^d   Nilsson, P O ^b   Starnberg, H I ^b   Blaha, P ^e  

^a SAARLAND UNIVERSITY   (Germany)

^b CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^c UNIVERSITY OF TOKYO   (Japan)

^d INSTITUTE OF MATERIALS STRUCTURE SCIENCE   (Japan)

^e VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^f Inst High Perf Computations D   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; BAND STRUCTURE; COPPER; CRYSTALLINE MATERIALS; ELECTRON DIFFRACTION; ELECTRON ENERGY LEVELS; MATHEMATICAL TECHNIQUES; PHOTOEMISSION; PROBABILITY DENSITY FUNCTION;

ABSOLUTE BAND MAPPING; BLOCH WAVES; DIFFERENTIAL TRANSMISSION; SURFACE ORIENTATION; VERY LOW ENERGY ELECTRON DIFFRACTION;

ELECTRONIC STRUCTURE;

EID: 0032583012     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.81.4943     Document Type: Article

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