Plasma chemical vapor deposition of a-C:S:N:H films using organoisothiocyanates as novel single-source precursors

Thin Solid Films

Volumn 289, Issue 1-2, 1996, Pages 112-120

  Wrobel A M ^a   Kryszewski, M ^a   Czeremuszkin, G ^a  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

Author keywords

C:S:N:H films; Organoisothiocyanates; Photoconductive; Plasma chemical vapor deposition

Indexed keywords

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTAL STRUCTURE; DIELECTRIC MATERIALS; ELECTRIC CONDUCTIVITY; ELECTRONS; HEAT TREATMENT; LIGHT ABSORPTION; ORGANIC COMPOUNDS; PHOTOCONDUCTIVITY; PLASMA APPLICATIONS;

DEPOSITION YIELD; OPTICAL GAPS; ORGANOISOTHIOCYANATES; PHOTOCONDUCTIVE; PLASMA ACTIVATION MECHANISM; PLASMA CHEMICAL VAPOR DEPOSITION; ULTRAVIOLET VISIBLE SPECTRA;

AMORPHOUS FILMS;

EID: 0030287031     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08915-8     Document Type: Article

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