Factors affecting pitch bias in lithography simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Robertson, Stewart A ^a   Pavelchek, Edward K ^a   Swible Keane, Catherine I ^a   Bohland, John F ^a   Reilly, Michael T ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LIGHTING; MATHEMATICAL MODELS;

DISSOLUTION RATE EQUATIONS; OPTICAL PROXIMITY EFFECTS; PITCH DEPENDENT BIAS; SOFTWARE PACKAGE PROLITH/2;

PHOTORESISTS;

EID: 0033716193     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (29)