Formation of planar waveguides by implantation of O into cubic silicon carbide

Journal of Physics D: Applied Physics

Volumn 34, Issue 3, 2001, Pages 257-268

  Jackson, S M ^a,b   Reed, G T ^a   Way, A S ^a   Kirkby, K J ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b Applied Materials   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTAL LATTICES; DISSOCIATION; INTERFACES (MATERIALS); ION IMPLANTATION; MICROSTRUCTURE; OXYGEN; POINT DEFECTS; SILICA; SILICON CARBIDE; THERMAL EFFECTS;

PLANAR WAVEGUIDES; SELF INTERSTITIALS;

OPTICAL WAVEGUIDES;

EID: 0034830168     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/34/3/302     Document Type: Article

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