RBS/simulated annealing analysis of silicide formation in Fe/Si systems

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 139, Issue 1-4, 1998, Pages 235-238

  Barradas, N P ^a   Jeynes, C ^a   Homewood, K P ^a   Sealy, B J ^a   Milosavljevic, M ^b  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

Ion beam mixing; Rutherford Backscattering; Silicides; Simulated annealing

Indexed keywords

ALGORITHMS; ENERGY GAP; ION IMPLANTATION; IRON; METALLIC FILMS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SIMULATED ANNEALING; SPUTTER DEPOSITION; THERMAL EFFECTS;

PHOTOABSORPTION; SILICIDE;

NUCLEAR INSTRUMENTATION;

EID: 0032041555     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00964-6     Document Type: Article

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