Nitridation of (Ba,Sr)TiO3 films in an inductively coupled plasma

Journal of Non-Crystalline Solids

Volumn 280, Issue 1-3, 2001, Pages 211-216

  Wuu, D S ^a   Horng, R H ^b   Liao, F C ^a   Lin, C C ^b  

^a DA YEH UNIVERSITY   (Taiwan)

^b NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; BARIUM COMPOUNDS; CURRENT DENSITY; LEAKAGE CURRENTS; MOS CAPACITORS; NITRIDING; PERMITTIVITY; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

INDUCTIVELY COUPLED PLASMA; LANGMUIR PROBE;

SEMICONDUCTING FILMS;

EID: 0034818147     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(00)00377-X     Document Type: Article

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