Performance improvement of metal gate CMOS technologies

IEEE Symposium on VLSI Circuits, Digest of Technical Papers

Volumn , Issue TECHNOLOGY SYMP., 2001, Pages 63-64

  Matsuda, S ^a   Yamakawa, H ^a   Azuma, A ^a   Toyoshima, Y ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; INTERFACES (MATERIALS); OSCILLATORS (ELECTRONIC); SEMICONDUCTOR JUNCTIONS; SILICA; THRESHOLD VOLTAGE; VOLTAGE CONTROL;

METAL GATE PROCESSES; RING OSCILLATORS;

CMOS INTEGRATED CIRCUITS;

EID: 0034795420     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)